Dutch equipment supplier SALD has announced delivery of a spatial atomic layer deposition system to an unnamed customer in the United States. The tool will be used in the pilot-scale production of ...

SkyWater Technology has announced it will offer customers a new semiconductor processing tool for atomic layer deposition (ALD), the Applied Picosun Morpher. Many devices, such as sensors and emerging ...

Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...

Using atomic layer deposition, a research team from the City University of Hong Kong has created an an oxygen-deficient tin oxide layer to replace the more common fullerene electron transport layer in ...

A pathway for ALD-enhanced materials to be quickly developed and transitioned from lab-scale to commercial production is available for almost any application, for the first time ever. Atomic-level ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...