SOP 系のオブジェクトと Line MAT を使って法線ベクトル方向に動きを作る表現． 2:05 Line MAT でマテリアルをワイヤーフレームに変換 3:00 Line MAT の Depth Test を OFF にする 3:13 Line MAT の Draw Points を ON にして，ワイヤー状にドットを表示する 4:01 Geometory COMP の RotateY ...

imec, the research and innovation hub, has announced the first electrical test (e-test) results obtained on 20nm pitch metal line structures patterned after single-exposure High NA EUV lithography.

Minority investments in private-equity firms are becoming increasingly popular, but a structural feature in some of these deals could present risks. Top-line deal structures, in which the buyer of a ...

Belgian research lab Imec has revealed advances single-print high numerical aperture EUV lithography at the ‘SPIE Photomask Technology + EUV Lithography’ conference in Monterey California: Line ...